Deposition and characterization of nanocrystalline silicon

Ristić, Davor (2010) Deposition and characterization of nanocrystalline silicon. Doctoral thesis, Faculty of Science > Department of Physics.

Language: Croatian

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Thin silicon, silicon-dioxide and silicon-rich oxide (SiOx) films were produced using the LPCVD (Low Pressure Chemical Vapor Deposition) method. The depositions were made under different conditions, where the composition and the partial pressures of the reactant gasses and the deposition temperature were varied. By thermal annealing of SiOx films under temperatures from 800 to 1200 oC nanoparticles of different sizes were formed. The nanoparticles were characterised using Raman, infrared and absorption spectroscopy and scanning electron microscopy. The theoretical model of Raman scattering on optical and acoustical vibrational modes of silicon nanoparticles was developed.

Item Type: Thesis (Doctoral thesis)
Keywords: amorphous silicon ; nanoparticles ; Raman spectroscopy ; silicon ; silicon-rich oxide
Supervisor: Ivanda, Mile
Date: 12 April 2010
Number of Pages: 105
Subjects: NATURAL SCIENCES > Physics
Divisions: Faculty of Science > Department of Physics
Depositing User: Gordana Stubičan Ladešić
Date Deposited: 22 Dec 2013 21:52
Last Modified: 26 Dec 2013 22:40

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