Silicon surface irradiated by nitrogen laser radiation

Henč-Bartolić, Višnja and Andreić, Željko and Gracin, Davor and Kunze, Hans-Joachim and Stubičar, Mirko (1997) Silicon surface irradiated by nitrogen laser radiation. Fizika A, 6 (2). pp. 97-102. ISSN 1330-0008

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Monocrystalline silicon target was irradiated with a nitrogen laser beam (alfa = 337 nm, maximum energy density 1.1 J/cm^2, pulse duration 6 ns and repetition rate 0.2 Hz). The plasma formed at the silicon surface was observed spetroscopically in air (n_e = 3×10^18 cm^-3, T_e = 18 500 K) and in vacuum (n_e = 6.5×10^17 cm^-3, T_e = 16 000 K). The irradiated surface in vacuum was studied by a metallographic microscope. Droplets were created at crater edges. Their formation is explained by the hydrodynamical sputtering model.

Item Type: Article
Date: 1997
Subjects: NATURAL SCIENCES > Physics
Divisions: Faculty of Science > Department of Physics
Publisher: Hrvatsko fizikalno društvo
Depositing User: Gordana Stubičan Ladešić
Date Deposited: 31 Mar 2014 20:57
Last Modified: 15 Apr 2014 16:44

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